Hardness and Modulus Studies on Dielectric Thin Films
Author:
Publisher
Springer Science and Business Media LLC
Subject
General Engineering
Reference8 articles.
1. X‐ray diffraction determination of the effect of various passivations on stress in metal films and patterned lines
2. Finite Element Calculations of Thermal Stresses in Passivated and Unpassivated Lines Bonded to Substrates
3. Measurement and Interpretation of stress in aluminum-based metallization as a function of thermal history
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