The Growth and Characterization of Epitaxial Fluoride Films on Semiconductors

Abstract

ABSTRACTThis review considers the growth and characterization of epitaxial alkaline earth fluoride compounds on semiconductors. The field has developed quite rapidly in recent years, from the original demonstration of epitaxial growth in these systems to the investigation of the structure and properties of the layers. Two recent developments are reviewed in detail: the epitaxial relations which have been discovered between fluoride films and semiconductor substrates and the variety of interface structures which these systems display. These findings are beginning to lead to an understanding of the epitaxial growth process in these systems and how it relates to that in other more thoroughly studied systems.