Plasma Surface Interactions and Surface Properties for Remote H-Plasma Cleaning of Si(100)
Author:
Publisher
Springer Science and Business Media LLC
Subject
General Engineering
Reference20 articles.
1. Low‐temperature preparation of SiO2/Si(100) interfaces using a two‐step remote plasma‐assisted oxidation‐deposition process
2. Infrared spectroscopy of Si(111) and Si(100) surfaces after HF treatment: Hydrogen termination and surface morphology
3. Silicon surface passivation by hydrogen termination: A comparative study of preparation methods
4. Process and Surface Characterization of Hydrogen Plasma Cleaning of Si(100)
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