Author:
Lubguban J.A.,Gangopadhyay S.,Lahlouh B.,Rajagopalan T.,Biswas N.,Sun J.,Huang D.H.,Simon S.L.,Mallikarjunan A.,Kim H-C.,Hedstrom J.,Volksen W.,Miller R.D.,Toney M.F.
Abstract
We present a supercritical CO2(SCCO2) process for the preparation of nanoporous organosilicate thin films for ultralow dielectric constant materials. The porous structure was generated by SCCO2extraction of a sacrificial poly(propylene glycol) (PPG) from a nanohybrid film, where the nanoscopic domains of PPG porogen are entrapped within the crosslinked poly(methylsilsesquioxane) (PMSSQ) matrix. As a comparison, porous structures generated by both the usual thermal decomposition (at approximately 450 °C) and by a SCCO2process for 25 and 55 wt% porogen loadings were evaluated. It is found that the SCCO2process is effective in removing the porogen phase at relatively low temperatures (<200 °C) through diffusion of the supercritical fluid into the phase-separated nanohybrids and selective extraction of the porogen phase. Pore morphologies generated from the two methods are compared from representative three-dimensional (3D) images built from small-angle x-ray scattering (SAXS) data.
Publisher
Springer Science and Business Media LLC
Subject
Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science
Cited by
15 articles.
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