Low-korganosilicate films prepared by tetravinyltetramethylcyclotetrasiloxane
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1483916
Reference12 articles.
1. Effects of Si—C Bond Content on Film Properties of Organic Spin‐on Glass
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3. Chemical-Vapor Deposition of OH-free and Low-kOrganic-Silica Films
4. A Fluorinated Organic-Silica Film with Extremely Low Dielectric Constant
5. Water Absorption Properties of Fluorine-DopedSiO2Films Using Plasma-Enhanced Chemical Vapor Deposition
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