Catalytic Chemical Vapor Deposition (CTL-CVD) Method to Obtain High Quality Amorphous Silicon Alloys
Author:
Publisher
Springer Science and Business Media LLC
Subject
General Engineering
Reference6 articles.
1. Chemical Vapor Deposition of a-SiGe:H Films Utilizing a Microwave-Excited Plasma
2. Catalytic Chemical Vapor Deposition (CTC-CVD) Method Producing High Quality Hydrogenated Amorphous Silicon
3. Guiding Principle in the Preparation of High-Photosensitive Hydrogenated Amorphous Si-Ge Alloys from Glow-Discharge Plasma
4. High Quality Amorphous Silicon Prepared by Catalytic Chemical Vapor Deposition (CTL-CVD) Method
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