Subject
Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials
Reference80 articles.
1. Catalytic chemical vapor deposition (CTL-CVD) method producing high quality hydrogenated amorphous silicon;Matsumura;Jpn. J. Appl. Phys.,1986
2. Deposition of device quality, low-H content amorphous-silicon;Mahan;J. Appl. Phys.,1991
3. Frontiers in HWCVD;Schropp;Thin Solid Films,2009
4. Reflection and dissociation of H2 on tungsten;Smith;J. Chem. Phys.,1962
5. H.J. Wiesmann, Method of producing hydrogenated amorphous silicon film, US patent 4,237,150; Dec. 2, 1980.
Cited by
38 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献