Narrow gap a-SiGe:H grown by hot-wire chemical vapor deposition-Reference-Cited by-同舟云学术

Narrow gap a-SiGe:H grown by hot-wire chemical vapor deposition

Published:2003-04 Issue:1-2 Volume:430 Page:104-109
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Nelson Brent P.,Xu Yueqin,Williamson D.L.,Han Daxing,Braunstein Rubin,Boshta M.,Alavi B.

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference15 articles.

1. Y. Xu, B.P. Nelson, L.M. Gedvilas, R.C. Reedy, September 2002, 2nd International Conference on Cat-CVD (Hot-Wire CVD) Process, Denver, CO, Thin Solid Films, submitted for publication

2. D. Cohen, NREL subcontract report SR-520-28050 (2000) (http://www.eren.doe.gov/pv/onlineind.html)

3. NCPV Photovoltaics Program Review, AIP Conf. Proc. No. 462, AIP, Woodbury, NY;Williamson,1999

4. Comparative anomalous small-angle x-ray scattering study of hotwire and plasma grown amorphous silicon–germanium alloys

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