1. Theory and application of a two-layer Hall technique
2. 3. Nordell N. , Andersson S.G. , and Schöner A. in Proc. 6th Int. Conf. on Silicon Carbide and Related Materials - 1995, Sept.18–21, 1995, Kyoto, Japan
3. 4. Schöner A. , Nordell N. , Rottner K. , Helbig R. , and Pensl G. in Proc. 6th Int. Conf. on Silicon Carbide and Related Materials - 1995, Sept. 18–21, 1995, Kyoto, Japan