Study of the effect of the deposition RF power on the characteristics of microcrystalline Silicon-Germanium thin films produced by PECVD-Reference-Cited by-同舟云学术

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Study of the effect of the deposition RF power on the characteristics of microcrystalline Silicon-Germanium thin films produced by PECVD

Published:2018-12 Issue:64 Volume:3 Page:3939-3947
ISSN:2059-8521
Container-title:MRS Advances
language:en
Short-container-title:MRS Advances

Author:

Torres Arturo,Moreno Mario,Rosales Pedro,Domínguez Miguel,Torres Alfonso,Itzmoyotl Adrian,Ambrosio Roberto,Hidalga Javier de la

Publisher

Springer Science and Business Media LLC

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Link

http://link.springer.com/content/pdf/10.1557/adv.2018.645.pdf

Reference14 articles.

1. S. Kim, C. Park, J. C. Lee, J. S. Cho, and Y. Kim, J. Curr. Appl. Phys. 13, 457–460, (2013).

2. M. Domínguez, P. Rosales, A. Torres, M. Moreno, J. Molina, F. De Hidalga, C. Zúñiga, and W. Calleja, J. Non. Cryst. Solids, 358, 2340–2343, (2012).

3. Z. Tang, W. Wang, D. Wang, D. Liu, Q. Liu, M. Yin, D. He, J. Appl. Surf. Sci., 256, 7032–7036, (2010)

4. R. Xu, W. Li, J. He, Y. Sun, and Y. D. Jiang, J. Non Cryst. Solids, 365, 37–42- (2013).

5. L. Zhang, J. Zhang, X. Zhang, Y. Cao, and Y. Zhao, J. Thin Solid Films, 520, 5940–5945, (2012).

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