Author:
Allen S. D.,Trigubo A. B.,Jan R. Y.
Abstract
ABSTRACTMetal, dielectric and semiconductor films have been deposited by laser chemical vapor deposition (LCVD) using both pulsed and cw laser sources on a variety of substrates. For LCVD on substrates such as quartz, the deposition was monitored optically in both transmission and reflection using a collinear visible laser and the depositing CO2 laser. Deposition initiation and rate were correlated with irradiation conditions, the laser generated surface temperature, and the changing optical properties of the filmpsubstrate during deposition. Single crystallites of W greater than 100 pm tall were deposited using a Kr laser on Si substrates.
Publisher
Springer Science and Business Media LLC
Reference14 articles.
1. 13. Tisone G. and Johnson A. W. , private communication.
2. 3. Allen S. D. and Trigubo A. B. , J. Appl. Phys., to be published (2/83).
3. Vapor Deposition
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