3D Patterning of Si by Contact Etching With Nanoporous Metals-Reference-Cited by-同舟云学术

3D Patterning of Si by Contact Etching With Nanoporous Metals

Published:2019-04-25 Issue: Volume:7 Page:
ISSN:2296-2646
Container-title:Frontiers in Chemistry
language:
Short-container-title:Front. Chem.

Author:

Bastide Stéphane,Torralba Encarnacion,Halbwax Mathieu,Le Gall Sylvain,Mpogui Elias,Cachet-Vivier Christine,Magnin Vincent,Harari Joseph,Yarekha Dmitri,Vilcot Jean-Pierre

Funder

Agence Nationale de la Recherche

Publisher

Frontiers Media SA

Subject

General Chemistry

Reference32 articles.

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4. Metal-assisted chemical etching of silicon in HF–H2O2;Chartier;Electrochimica Acta,2008

5. Survey of the metal nucleation processes on silicon surfaces in fluoride solutions: from dilute HF to concentrated NH4F solutions;Chemla;J. Electroanal. Chem.,2003

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