Survey of the metal nucleation processes on silicon surfaces in fluoride solutions: from dilute HF to concentrated NH4F solutions
Author:
Publisher
Elsevier BV
Subject
Electrochemistry,General Chemical Engineering,Analytical Chemistry
Reference31 articles.
1. Segregation and Removal of Metallic Impurity at Interface of Silicon and Fluorine Etchant
2. Mechanisms of Metallic Impurity Deposition on Silicon Substrates Dipped in Cleaning Solution
3. Total Room Temperature Wet Cleaning for Si Substrate Surface
4. Electrochemical and Radiochemical Study of Copper Contamination Mechanism from HF Solutions onto Silicon Substrates
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