Corrosion Resistance and Titanium Ion Release of Hybrid Dental Implants

Abstract

One of the strategies for the fight against peri-implantitis is the fabrication of titanium dental implants with the part close to the neck without roughness. It is well known that roughness favors osseointegration but hinders the formation of biofilm. Implants with this type of structure are called hybrid dental implants, which sacrifice better coronal osseointegration for a smooth surface that hinders bacterial colonization. In this contribution, we have studied the corrosion resistance and the release of titanium ions to the medium of smooth (L), hybrid (H), and rough (R) dental implants. All implants were identical in design. Roughness was determined with an optical interferometer and residual stresses were determined for each surface by X-ray diffraction using the Bragg–Bentano technique. Corrosion studies were carried out with a Voltalab PGZ301 potentiostat, using Hank’s solution as an electrolyte at a temperature of 37 °C. Open-circuit potentials (Eocp), corrosion potential (Ecorr), and current density (icorr) were determined. Implant surfaces were observed by JEOL 5410 scanning electron microscopy. Finally, for each of the different dental implants, the release of ions into Hank’s solution at 37 °C at 1, 7, 14, and 30 days of immersion was determined by ICP-MS. The results, as expected, show a higher roughness of R with respect to L and compressive residual stresses of −201.2 MPa and −20.2 MPa, respectively. These differences in residual stresses create a potential difference in the H implant corresponding to Eocp of −186.4 mV higher than for the L and R of −200.9 and −192.2 mV, respectively. The corrosion potentials and current intensity are also higher for the H implants (−223 mV and 0.069 μA/mm2) with respect to the L (−280 mV and 0.014 μA/mm2 and R (−273 mV and 0.019 μA/mm2). Scanning electron microscopy revealed pitting in the interface zone of the H implants and no pitting in the L and R dental implants. The titanium ion release values to the medium are higher in the R implants due to their higher specific surface area compared to the H and L implants. The maximum values obtained are low, not exceeding 6 ppb in 30 days.