Development of the Tele-Measurement of Plasma Uniformity via Surface Wave Information (TUSI) Probe for Non-Invasive In-Situ Monitoring of Electron Density Uniformity in Plasma Display Fabrication Process
Author:
Kim Si-Jun1ORCID, Choi Min-Su1, Lee Sang-Ho2, Jeong Won-Nyoung1, Lee Young-Seok1ORCID, Seong In-Ho1ORCID, Cho Chul-Hee1ORCID, Kim Dae-Woong2, You Shin-Jae13ORCID
Affiliation:
1. Applied Physics Lab for PLasma Engineering (APPLE), Department of Physics, Chungnam National University, Daejeon 34134, Republic of Korea 2. Department of Plasma Engineering, Korea Institute of Machinery and Materials (KIMM), Daejeon 34104, Republic of Korea 3. Institute of Quantum Systems (IQS), Chungnam National University, Daejeon 34134, Republic of Korea
Abstract
The importance of monitoring the electron density uniformity of plasma has attracted significant attention in material processing, with the goal of improving production yield. This paper presents a non-invasive microwave probe for in-situ monitoring electron density uniformity, called the Tele-measurement of plasma Uniformity via Surface wave Information (TUSI) probe. The TUSI probe consists of eight non-invasive antennae and each antenna estimates electron density above the antenna by measuring the surface wave resonance frequency in a reflection microwave frequency spectrum (S11). The estimated densities provide electron density uniformity. For demonstration, we compared it with the precise microwave probe and results revealed that the TUSI probe can monitor plasma uniformity. Furthermore, we demonstrated the operation of the TUSI probe beneath a quartz or wafer. In conclusion, the demonstration results indicated that the TUSI probe can be used as an instrument for a non-invasive in-situ method for measuring electron density uniformity.
Funder
National Research Council of Science & Technology (NST) grant funded by the Korean government Next-Generation Intelligence Semiconductor R&D Program through the Korea Evaluation Institute of Industrial Technology (KEIT) funded by the Korean government Korea Institute of Energy Technology Evaluation and Planning (KETEP) and the MOTIE of the Republic of Korea MOTIE KSRC Korea Institute for Advancement of Technology (KIAT) grant funded by the Korean Government Basic Science Research Program through the National Research Foundation of Korea (NRF) funded by the Ministry of Education KIMM Institutional Program NST/KIMM “Regional Innovation Strategy (RIS)” through the National Research Foundation of Korea(NRF) funded by the Ministry of Educatio
Subject
Electrical and Electronic Engineering,Biochemistry,Instrumentation,Atomic and Molecular Physics, and Optics,Analytical Chemistry
Reference35 articles.
1. The 2020 plasma catalysis roadmap;Bogaerts;J. Phys. D Appl. Phys.,2020 2. Low-temperature plasma for biology, hygiene, and medicine: Perspective and roadmap;Laroussi;IEEE Trans. Radiat. Plasma Med. Sci.,2022 3. Lieberman, M.A., and Lichtenberg, A.J. (2005). Principles of Plasma Discharges and Materials Processing, John Wiley & Sons. 4. You, Y.B., Lee, Y.S., Kim, S.J., Cho, C.H., Seong, I.H., Jeong, W.N., Choi, M.S., and You, S.J. (2022). Influence of Additive N2 on O2 Plasma Ashing Process in Inductively Coupled Plasma. Nanomaterials, 12. 5. Lee, Y., Yeom, H., Choi, D., Kim, S., Lee, J., Kim, J., Lee, H., and You, S. (2022). Database Development of SiO2 Etching with Fluorocarbon Plasmas Diluted with Various Noble Gases of Ar, Kr, and Xe. Nanomaterials, 12.
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