Affiliation:
1. Applied Physics Lab for PLasma Engineering (APPLE), Department of Physics, Chungnam National University, Daejeon 34134, Republic of Korea
2. Institute of Quantum Systems (IQS), Chungnam National University, Daejeon 34134, Republic of Korea
Abstract
Electron temperature has attracted great attention in plasma processing, as it dominates the production of chemical species and energetic ions that impact the processing. Despite having been studied for several decades, the mechanism behind the quenching of electron temperature with increasing discharge power has not been fully understood. In this work, we investigated the quenching of electron temperature in an inductively coupled plasma source using Langmuir probe diagnostics, and suggested a quenching mechanism based on the skin effect of electromagnetic waves within local- and non-local kinetic regimes. This finding provides insight into the quenching mechanism and has implications for controlling electron temperature, thereby enabling efficient plasma material processing.
Funder
National Research Council of Science & Technology
Korea Evaluation Institute of Industrial Technology
Korea Institute of Energy Technology Evaluation and Planning
MOTIE
KSRC
Korea Institute for Advancement of Technology
National Research Foundation of Korea
KIMM Institutional Program
National Research Foundation of Kore
Subject
General Materials Science
Cited by
1 articles.
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