Computational Study on the Parallel Double-Curling Probe for Multi-Site Electron Density Measurement in Low-Temperature Plasma-Reference-Cited by-同舟云学术

Computational Study on the Parallel Double-Curling Probe for Multi-Site Electron Density Measurement in Low-Temperature Plasma

Published:2023-09-12 Issue:5 Volume:32 Page:127-133
ISSN:2288-6559
Container-title:Applied Science and Convergence Technology
language:en
Short-container-title:Appl. Sci. Converg. Technol.

Author:

Kim Si-Jun¹²^ORCID,Jeong Won-Nyoung¹,Lee Young-Seok¹²^ORCID,Seol You-Bin¹²^ORCID,Cho Chul-Hee¹^ORCID,Seong In-Ho¹^ORCID,Choi Min-Su¹^ORCID,You Shin-Jae¹²^ORCID

Affiliation:

1. Applied Physics lab for PLasma Engineering (APPLE), Department of Physics, Chungnam National University, Daejeon 34134, Republic of Korea

2. Institute of Quantum Systems (IQS), Chungnam National University, Daejeon 34134, Republic of Korea

Funder

Chungnam National University

Publisher

The Korean Vacuum Society

Subject

General Medicine,Electrical and Electronic Engineering,Physical and Theoretical Chemistry,Condensed Matter Physics,Materials Science (miscellaneous)

Link

https://pdf.medrang.co.kr/ASCT/2023/032/ASCT032-05-127.pdf

Reference31 articles.

1. Characterization of SiO2 Etching Profiles in Pulse-Modulated Capacitively Coupled Plasmas

2. Characterization of SiO2 Over Poly-Si Mask Etching in Ar/C4F8 Capacitively Coupled Plasma

3. Plasma treatment effect on angiogenesis in wound healing process evaluated in vivo using angiographic optical coherence tomography

4. Plasma Bioscience and Medicines

5. Plasma agriculture: Review from the perspective of the plant and its ecosystem

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