Investigation of Surface Pre-Treatment Methods for Wafer-Level Cu-Cu Thermo-Compression Bonding

Author:

Tanaka KokiORCID,Wang Wei-Shan,Baum Mario,Froemel Joerg,Hirano Hideki,Tanaka Shuji,Wiemer Maik,Otto Thomas

Funder

Ministry of Education, Culture, Sports, Science, and Technology

Publisher

MDPI AG

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Control and Systems Engineering

Cited by 12 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Surface co-hydrophilization via ammonia inorganic strategy for low-temperature Cu/SiO2 hybrid bonding;Journal of Materials Science & Technology;2023-06

2. Room temperature bonding of Au assisted by self-assembled monolayer;Applied Physics Letters;2023-01-30

3. Fluxless Bonding Via In-Situ Oxide Reduction;2022 IEEE 24th Electronics Packaging Technology Conference (EPTC);2022-12-07

4. Electroplated Al Press Marking for Wafer-Level Bonding;Micromachines;2022-07-30

5. Prolongation of the Surface Activation Effect using Self-Assembled Monolayer for Low Temperature Bonding of Au;2022 IEEE 72nd Electronic Components and Technology Conference (ECTC);2022-05

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