Low Dielectric Constant Photocurable Fluorinated Poly (Phthalazinone Ether) Ink with Excellent Mechanical Properties and Heat Resistance

Author:

Zhang Guangsheng123,Wang Chenghao123,Jiang Lingmei123,Wang Yibo123,Wang Bing234,Wang Xiaoxu123,Liu Haoran123,Zong Lishuai123,Wang Jinyan123ORCID,Jian Xigao123

Affiliation:

1. School of Chemical Engineering, Dalian University of Technology, Dalian 116024, China

2. State Key Laboratory of Fine Chemicals, Dalian University of Technology, Dalian 116024, China

3. Technology Innovation Center of High Performance Resin Materials, Dalian 116024, China

4. School of Materials Science and Engineering, Dalian University of Technology, Dalian 116024, China

Abstract

The photosensitive resins for 3D printing technology have been widely applied throughout the advanced communication field due to their merits of high molding accuracy and fast processing speed. Regardless, they, in particular, should have better mechanical properties, heat resistance, and dielectric properties. Herein, photocurable fluorinated poly (phthalazinone ether) (FSt-FPPE) was utilized as a prepolymer to improve the performance of photosensitive resin. A series of UV-curable inks named FST/DPGs were prepared with FSt-FPPE and acrylic diluents of different mass fractions. The FST/DPGs were cured into films by UV curing and post-treatment. After curing, their properties were characterized in detail. In terms of heat resistance, glass transition temperature (Tg) could reach 233 °C and the 5% thermal decomposition temperature (Td5%) was 371 °C. The tensile strength surprisingly reached 61.5 MPa, and the dielectric constant (Dk) could be significantly reduced to 2.75. Additionally, FST/DPGs were successfully employed in UV-assisted direct writing (DIW) to print 3D objects that benefited from their commendable fluidity and rapid curing speed. A stiff cylinder sample with a smooth surface and distinct pattern was ultimately obtained, indicating their remarkable 3D printing adaptation. Such photosensitive resin for UV-assisted DIW exhibits tremendous potential in the electronic industry.

Funder

National Natural Science Foundation of China

Publisher

MDPI AG

Subject

Polymers and Plastics,General Chemistry

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