Investigation into Photolithography Process of FPCB with 18 µm Line Pitch
Author:
Affiliation:
1. The Institute of Technological Sciences, Wuhan University, Wuhan 430072, China
2. School of Power and Mechanical Engineering, Wuhan University, Wuhan 430072, China
3. Jiangsu Leader-Tech Semiconductor Co., Ltd., Pizhou 221300, China
Abstract
Funder
Hubei Provincial Natural Science Foundation of China
Publisher
MDPI AG
Subject
Electrical and Electronic Engineering,Mechanical Engineering,Control and Systems Engineering
Link
https://www.mdpi.com/2072-666X/14/5/1020/pdf
Reference20 articles.
1. Self-powered flexible printed circuit board with integrated triboelectric generator;Meng;Nano Energy,2013
2. Investigation on chemical etching process of FPCB with 18 μm line pitch;Sheng;IEEE Access,2021
3. Investigation on spraying uniformity in etching process of FPCB with 18 μm line pitch;Ming;Int. J. Precis. Eng. Manuf.,2022
4. Zhou, Z.F., and Huang, Q. (2018). Comprehensive simulations for ultraviolet lithography process of thick SU-8 photoresist. Micromachines, 9.
5. Optical lithography simulation for the whole resist process;Kim;Curr. Appl. Phys.,2006
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