Optical lithography simulation for the whole resist process-Reference-Cited by-同舟云学术

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Optical lithography simulation for the whole resist process

Published:2006-01 Issue:1 Volume:6 Page:48-53
ISSN:1567-1739
Container-title:Current Applied Physics
language:en
Short-container-title:Current Applied Physics

Author:

Kim Sang-Kon,Lee Ji-Eun,Park Seung-Wook,Oh Hye-Keun

Publisher

Elsevier BV

Subject

General Physics and Astronomy,General Materials Science

Reference7 articles.

1. C.A. Mack, Inside PROLITH: A Compreshensive Guide to Optical Lithography Simulation, FINLE Technologies, Austin, 1997.

2. LAVA web-based remote simulation: enhancements for education and technology innovation

3. http://www.kla-tencor.com.

4. http://www.solid-c.de.

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