Author:
Li Jianfei,Chen Duo,Li Kuilong,Wang Qiang,Shi Mengyao,Diao Dejie,Cheng Chen,Li Changfu,Leng Jiancai
Abstract
GaN-based green light-emitting diodes (LEDs) with different thicknesses of the low-temperature (LT) p-GaN layer between the last GaN barriers and p-AlGaN electron blocking layer were characterized by photoluminescence (PL) and electroluminescence (EL) spectroscopic methods in the temperature range of 6–300 K and injection current range of 0.01–350 mA. Based on the results, we suggest that a 20 nm-thick LT p-GaN layer can effectively prevent indium (In) re-evaporation, improve the quantum-confined Stark effect in the last quantum well (QW) of the active region, and finally reduce the efficiency droop by about 7%.
Funder
Natural Science Foundation of Shandong Province of China
National Natural Science Foundation of China
China Postdoctoral Science Foundation
Subject
General Materials Science,General Chemical Engineering
Cited by
5 articles.
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