Overview of Metal CVD-Reference-Cited by-同舟云学术

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Overview of Metal CVD

Published: Issue: Volume: Page:429-498
ISSN:
Container-title:The Chemistry of Metal CVD
language:
Short-container-title:

Author:

Kodas Toivo T.,Hampden-Smith Mark J.

Publisher

Wiley-VCH Verlag GmbH

Cited by 14 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Area‐Selective Chemical Vapor Deposition of Gold by Electron Beam Seeding;Advanced Materials;2024-04-18

2. Optimisation of processing conditions during CVD growth of 2D WS2 films from a chloride precursor;Journal of Materials Science;2022-01

3. Thermally Driven Self-Limiting Atomic Layer Etching of Metallic Tungsten Using WF6 and O2;ACS Applied Materials & Interfaces;2018-02-20

4. Additive Manufacturing of Metal Structures at the Micrometer Scale;Advanced Materials;2017-01-04

5. Using Hydrogen To Expand the Inherent Substrate Selectivity Window During Tungsten Atomic Layer Deposition;Chemistry of Materials;2016-01-04

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