Affiliation:
1. Ferdinand‐Braun‐Institut (FBH) Leibniz‐Institut für Höchstfrequenztechnik Gustav‐Kirchhoff‐Str. 4 D‐12489 Berlin Germany
2. Empa ‐ Swiss Federal Laboratories for Materials Science and Technology Laboratory for Mechanics of Materials and Nanostructures Feuerwerkerstrasse 39 Thun CH‐3602 Switzerland
Abstract
AbstractChemical vapor deposition (CVD) is an established method for producing high‐purity thin films, but it typically necessitates the pre‐ and post‐processing using a mask to produce structures. This study presents a novel maskless patterning technique that enables area‐selective CVD of gold. A focused electron beam is used to decompose the metal–organic precursor Au(acac)Me2 locally, thereby creating an autocatalytically active seed layer for subsequent CVD with the same precursor. The procedure can be included in the same CVD process without the need for clean room lithographic processing. Moreover, it operates at low temperatures of 80 °C, over 200 K lower than standard CVD temperatures for this precursor, reducing thermal load on the specimen. Given that electron beam seeding operates on any even moderately conductive surface, the process does not constrain device design. This is demonstrated by the example of vertical nanostructures with high aspect ratios of ≈40:1 and more. Written using a focused electron beam and the same precursor, these nanopillars exhibit catalytically active nuclei on their surface. Furthermore, by using the onset of the autocatalytic CVD growth, for the first time the local temperature increase caused by the writing of nanostructures with an electron beam can be precisely determined.
Funder
Deutsche Forschungsgemeinschaft
Schweizerischer Nationalfonds zur Förderung der Wissenschaftlichen Forschung
Cited by
1 articles.
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