Precursors for ALD Processes
Author:
Publisher
Wiley-VCH Verlag GmbH & Co. KGaA
Link
http://onlinelibrary.wiley.com/wol1/doi/10.1002/9783527639915.ch3/fullpdf
Reference163 articles.
1. Surface photochemical phenomena in laser chemical vapor deposition;Higashi;J. Vac. Sci. Technol. B,1985
2. Sequential surface chemical reaction limited growth of high quality Al2O3 dielectrics;Higashi;Appl. Phys. Lett.,1989
3. ALD precursor chemistry: evolution and future challenges;Leskelä;J. Phys. IV,1999
4. Precursor selection in halide CVD of oxides;Hårsta;Chem. Vapor Depos.,1999
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