From Precursor Chemistry to Gas Sensors: Plasma‐Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications-Reference-Cited by-同舟云学术

From Precursor Chemistry to Gas Sensors: Plasma‐Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications

Published:2020-04-28 Issue:22 Volume:16 Page:1907506
ISSN:1613-6810
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language:en
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Author:

Mai Lukas¹^ORCID,Mitschker Felix²^ORCID,Bock Claudia³^ORCID,Niesen Alessia⁴,Ciftyurek Engin⁵^ORCID,Rogalla Detlef⁶^ORCID,Mickler Johannes⁴,Erig Matthias⁴,Li Zheshen⁷,Awakowicz Peter²,Schierbaum Klaus⁵^ORCID,Devi Anjana¹^ORCID

Affiliation:

1. Inorganic Materials ChemistryRuhr University Bochum Universitätsstr. 150 Bochum 44801 Germany

2. Institute of Electrical Engineering and Plasma TechnologyRuhr University Bochum Universitätsstr. 150 Bochum 44801 Germany

3. Microsystems TechnologyRuhr University Bochum Universitätsstr. 150 Bochum 44801 Germany

4. Forschung und Entwicklung, GB Sensorikparagon GmbH & Co KGaA Schwalbenweg 29 Delbrück 33129 Germany

5. Department of Material Science Institute of Experimental Condensed Matter PhysicsHeinrich Heine University Düsseldorf Universitätsstr. 1 Düsseldorf 40225 Germany

6. RUBIONRuhr University Bochum Universitätsstr. 150 Bochum 44801 Germany

7. Department of Physics and Astronomy – Centre for Storage Ring Facilities (ISA)Aarhus University Aarhus 8000 Denmark

Funder

Deutsche Forschungsgemeinschaft

Publisher

Wiley

Subject

Biomaterials,Biotechnology,General Materials Science,General Chemistry

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/smll.201907506

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1. A comprehensive review of ZnO materials and devices