Structural and Electrical Changes in Polycrystalline Silicon Thin Films That Are Heavily In Situ Boron-Doped and Thermally Oxidized with Dry Oxygen
Author:
Publisher
Wiley
Subject
Process Chemistry and Technology,Surfaces and Interfaces,General Chemistry
Reference39 articles.
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4. Ellipsometry-based conductivity extraction in case of phosphorus doped polysilicon;Journal of Materials Science: Materials in Electronics;2018-05-17
5. Influence of dopant concentration and type of substrate on the local organization of low-pressure chemical vapour deposition in situ boron doped silicon films from silane and boron trichloride;Thin Solid Films;2004-01
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