Disilanyl-amines ? compounds comprising the structural unit Si?Si?N, as single-source precursors for plasma-enhanced chemical vapour deposition (PE-CVD) of silicon nitride-Reference-Cited by-同舟云学术

Disilanyl-amines ? compounds comprising the structural unit Si?Si?N, as single-source precursors for plasma-enhanced chemical vapour deposition (PE-CVD) of silicon nitride

Published:1993-08 Issue:8 Volume:619 Page:1347-1352
ISSN:0044-2313
Container-title:Zeitschrift f�r anorganische und allgemeine Chemie
language:de
Short-container-title:Z. Anorg. Allg. Chem.

Author:

Schuh Heinz,Schlosser Thomas,Bissinger Peter,Schmidbaur Hubert

Publisher

Wiley

Subject

Inorganic Chemistry

Reference38 articles.

1. Siliciumwasserstoffe, X.: Stickstoffhaltige Verbindungen

2. Silyl compounds

3. Effect of Replacement of Carbon by Silicon in Trimethylamine on the Stabilities of the Trimethylboron Addition Compounds. Estimation of the Resonance Energy for Silicon-Nitrogen Partial Double Bond1

4. The Reaction of Silylamines with Boron Trifluoride. Methyl- and Silylaminoboron Difluorides

Cited by 18 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Synthesis, Characterization, and Thermal Properties of Chlorine‐Containing 1,1,2,2‐Tetraaminodisilanes and Their Potential as Chemical Vapor Deposition Precursors for Silicon Nitride Films;European Journal of Inorganic Chemistry;2015-06-18

2. Force field parameters for aminoorganosilanes;Journal of Molecular Structure;2015-01

3. Catenated Silicon Compounds;Comprehensive Inorganic Chemistry II;2013

4. Linear and Cyclic Polysilanes Containing the Bis(trimethylsilyl)amino Group: Synthesis, Reactions, and Spectroscopic Characterization;Inorganic Chemistry;2003-06-26

5. Thin-Film Deposition Materials;Handbook of Chemicals and Gases for the Semiconductor Industry;2002-07-15