Synthesis, Characterization, and Thermal Properties of Chlorine‐Containing 1,1,2,2‐Tetraaminodisilanes and Their Potential as Chemical Vapor Deposition Precursors for Silicon Nitride Films-Reference-Cited by-同舟云学术

Synthesis, Characterization, and Thermal Properties of Chlorine‐Containing 1,1,2,2‐Tetraaminodisilanes and Their Potential as Chemical Vapor Deposition Precursors for Silicon Nitride Films

Published:2015-06-18 Issue:19 Volume:2015 Page:3205-3211
ISSN:1434-1948
Container-title:European Journal of Inorganic Chemistry
language:en
Short-container-title:Eur. J. Inorg. Chem.

Author:

Du Liyong¹,Chu Wenxiang¹,Miao Hongyan¹,Wang Dawei¹,Xu Chongying¹²,Ding Yuqiang¹

Affiliation:

1. The Key Laboratory of Food Colloids and Biotechnology, Ministry of Education, School of Chemical and Material Engineering, Jiangnan University, Wuxi 214122, Jiangsu Province, P. R. China, http://www.jiangnan.edu.cn/

2. Jiangsu Nata Opto‐Electronic Material Co. Ltd., 7F One Lakepoint, No. 9 Cuiwei Street, Suzhou Industrial Park, Jiangsu Province, China

Publisher

Wiley

Subject

Inorganic Chemistry

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/ejic.201500493

Reference51 articles.

2. Silicon nitride and oxynitride films

3. The preparation, properties and applications of silicon nitride thin films deposited by plasma-enhanced chemical vapor deposition

4. A comparison of structures and properties of SiNx and SiOx films prepared by PECVD

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