Crystal recovery from Al-implantation induced damaging in 3C-SiC films
Author:
Publisher
Wiley
Subject
Condensed Matter Physics,General Materials Science
Link
http://onlinelibrary.wiley.com/wol1/doi/10.1002/pssr.201206064/fullpdf
Reference10 articles.
1. Fabrication of high performance 3C-SiC vertical MOSFETs by reducing planar defects
2. High-quality 6inch (111) 3C-SiC films grown on off-axis (111) Si substrates
3. Nitrogen doping of 3C-SiC thin films grown by CVD in a resistively heated horizontal hot-wall reactor
4. Demonstration of p-type 3C–SiC grown on 150mm Si(100) substrates by atomic-layer epitaxy at 1000°C
5. Structural and electrical characterizations of n-type implanted layers and ohmic contacts on 3C-SiC
Cited by 2 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Characterization for N- and P-type 3C-SiC on Si (100) substrate with thermal anneal and pulsed excimer laser anneal;Applied Surface Science;2013-02
2. Effects of Al Ion Implantation on 3C-SiC Crystal Structure;Materials Science Forum;2013-01
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