Extremely low surface recombination in 1 Ω cm n-type monocrystalline silicon
Author:
Affiliation:
1. Department of Materials; University of Oxford; Parks Rd OX1 3PH Oxford United Kingdom
2. Fraunhofer Institute for Solar Energy Systems ISE; Heidenhofstr. 2 79110 Freiburg Germany
Publisher
Wiley
Subject
Condensed Matter Physics,General Materials Science
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