Surface passivation of phosphorus-diffused n+-type emitters by plasma-assisted atomic-layer deposited Al2O3
Author:
Publisher
Wiley
Subject
Condensed Matter Physics,General Materials Science
Reference20 articles.
1. Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3
2. Excellent passivation of highly doped p-type Si surfaces by the negative-charge-dielectric Al2O3
3. Low‐Temperature Surface Passivation of Silicon for Solar Cells
4. On the c-Si surface passivation mechanism by the negative-charge-dielectric Al2O3
5. Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al[sub 2]O[sub 3]
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