Strain Tuning in Complex Oxide Epitaxial Films Using an Ultrathin Strontium Aluminate Buffer Layer

Author:

Lu Di1ORCID,Hikita Yasuyuki2,Baek David J.3,Merz Tyler A.4,Sato Hiroki25,Kim Bongju4,Yajima Takeaki26,Bell Christopher27,Vailionis Arturas8,Kourkoutis Lena F.910,Hwang Harold Y.24

Affiliation:

1. Department of Physics, Stanford University; Stanford CA 94305 USA

2. Stanford Institute for Materials and Energy Sciences, SLAC National Accelerator Laboratory; Menlo Park CA 94025 USA

3. School of Electrical and Computer Engineering, Cornell University; Ithaca NY 14853 USA

4. Department of Applied Physics Stanford University; Stanford CA 94305 USA

5. Department of Advanced Materials Science, The University of Tokyo; Kashiwa Chiba 277-8561 Japan

6. Department of Materials Engineering, The University of Tokyo; Bunkyo Tokyo 113-8656 Japan

7. H. H. Wills Physics Laboratory, University of Bristol; Tyndall Avenue Bristol BS8 1TL UK

8. Stanford Nano Shared Facilities, Stanford University; Stanford CA 94305 USA

9. School of Applied and Engineering Physics, Cornell University; Ithaca NY 14853 USA

10. Kavli Institute at Cornell for Nanoscale Science, Cornell University; Ithaca NY 14853 USA

Funder

National Science Foundation

NSF MRSEC program

Publisher

Wiley

Subject

Condensed Matter Physics,General Materials Science

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