Demonstration and STEM Analysis of Ferroelectric Switching in MOCVD‐Grown Single Crystalline Al0.85Sc0.15N

Author:

Wolff Niklas12ORCID,Schönweger Georg34ORCID,Streicher Isabel5ORCID,Islam Md Redwanul1ORCID,Braun Nils6ORCID,Straňák Patrik5,Kirste Lutz5ORCID,Prescher Mario5ORCID,Lotnyk Andriy6ORCID,Kohlstedt Hermann23ORCID,Leone Stefano5ORCID,Kienle Lorenz12,Fichtner Simon124ORCID

Affiliation:

1. Department of Material Science Kiel University Kaiserstr. 2 D‐24143 Kiel Germany

2. Kiel Nano, Surface and Interface Science (KiNSIS) Kiel University Christian‐Albrechts‐Platz 4 D‐24118 Kiel Germany

3. Department of Electrical and Information Engineering Kiel University Kaiserstr. 2 D‐24143 Kiel Germany

4. Fraunhofer Institute for Silicon Technology (ISIT) Fraunhoferstr. 1 D‐25524 Itzehoe Germany

5. Fraunhofer Institute for Applied Solid State Physics (IAF) Tullastr. 72 D‐79108 Freiburg Germany

6. Leibniz Institute of Surface Engineering (IOM) Permoserstr. 15 D‐04318 Leipzig Germany

Abstract

AbstractWurtzite‐type Al1−xScxN solid solutions grown by metal organic chemical vapor deposition are for the first time confirmed to be ferroelectric. The film with 230 nm thickness and x = 0.15 exhibits a coercive field of 5.5 MV cm−1 at a measurement frequency of 1.5 kHz. The single crystal quality and homogeneous chemical composition of the film are confirmed by X‐ray diffraction and spectroscopic methods such as time of flight secondary ion mass spectrometry. Annular bright field scanning transmission electron microscopy serves to prove the ferroelectric polarization inversion at the unit cell level. The single crystal quality further allows to image the large‐scale domain pattern of a wurtzite‐type ferroelectric for the first time, revealing a predominantly cone‐like domain shape along the c‐axis of the material. As in previous work, this again implies the presence of strong polarization discontinuities along this crystallographic axis, which can be suitable for current transport. The domains are separated by narrow domain walls, for which an upper thickness limit of 3 nm is deduced but which can potentially be atomically sharp. The authors are confident that these results will advance the commencement of the integration of wurtzite‐type ferroelectrics to GaN as well as generally III‐N‐based heterostructures and devices.

Funder

Deutsche Forschungsgemeinschaft

Bundesministerium für Bildung und Forschung

Publisher

Wiley

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