An N‐Heterocyclic Carbene Based Silver Precursor for Plasma‐Enhanced Spatial Atomic Layer Deposition of Silver Thin Films at Atmospheric Pressure-Reference-Cited by-同舟云学术

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An N‐Heterocyclic Carbene Based Silver Precursor for Plasma‐Enhanced Spatial Atomic Layer Deposition of Silver Thin Films at Atmospheric Pressure

Published:2018-12-03 Issue:49 Volume:57 Page:16224-16227
ISSN:1433-7851
Container-title:Angewandte Chemie International Edition
language:en
Short-container-title:Angew. Chem. Int. Ed.

Author:

Boysen Nils¹^ORCID,Hasselmann Tim²,Karle Sarah¹,Rogalla Detlef³^ORCID,Theirich Detlef²,Winter Manuela¹,Riedl Thomas²^ORCID,Devi Anjana¹^ORCID

Affiliation:

1. Inorganic Materials ChemistryChair of Inorganic Chemistry IIRuhr University Bochum Universitätsstraße 150 44801 Bochum Germany

2. Institute of Electronic DevicesUniversity of Wuppertal Rainer-Gruenter-Straße 21 42119 Wuppertal Germany

3. RUBIONRuhr University Bochum 44801 Bochum Germany

Publisher

Wiley

Subject

General Chemistry,Catalysis

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/anie.201808586

Reference26 articles.

1. Metal-nanostructures – a modern and powerful platform to create transparent electrodes for thin-film photovoltaics

2. Highly Elastic Graphene-Based Electronics Toward Electronic Skin

3. Dielectric properties of ultrathin metal films around the percolation threshold

4. Growth, morphology, and optical and electrical properties of semicontinuous metallic films

5. Atomic Layer Deposition: An Overview

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1. Atomic layer deposition (ALD) of palladium: from processes to applications;Critical Reviews in Solid State and Materials Sciences;2023-11-15

2. In Pursuit of Next Generation N-Heterocyclic Carbene-Stabilized Copper and Silver Precursors for Metalorganic Chemical Vapor Deposition and Atomic Layer Deposition Processes;Chemistry;2023-09-20

3. Flexible Transparent Electrodes Formed from Template‐Patterned Thin‐Film Silver;Advanced Materials;2023-06-29

4. Assessing the Environmental Impact of Atomic Layer Deposition (ALD) Processes and Pathways to Lower It;ACS Materials Au;2023-04-27

5. Atmospheric-pressure atomic layer deposition: recent applications and new emerging applications in high-porosity/3D materials;Dalton Transactions;2023

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