Ab initio chemical kinetics for the unimolecular decomposition of Si2 H5 radical and related reverse bimolecular reactions-Reference-Cited by-同舟云学术

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Ab initio chemical kinetics for the unimolecular decomposition of Si2 H5 radical and related reverse bimolecular reactions

Published:2013-10-07 Issue:4 Volume:114 Page:278-288
ISSN:0020-7608
Container-title:International Journal of Quantum Chemistry
language:en
Short-container-title:Int. J. Quantum Chem.

Author:

Wu Shang-Ying¹,Lee Yun-Min¹,Wu Jong-Shinn¹,Lin Ming-Chang²³

Affiliation:

1. Department of Mechanical Engineering; National Chiao Tung University; Hsinchu 300 Taiwan

2. Department of Applied Chemistry; Center for Interdisciplinary Molecular Science; National Chiao Tung University; Hsinchu 300 Taiwan

3. Department of Chemistry; Emory University; Atlanta Georgia 30322 USA

Funder

Ministry of Economics

Publisher

Wiley

Subject

Physical and Theoretical Chemistry,Condensed Matter Physics,Atomic and Molecular Physics, and Optics

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1002/qua.24557/fullpdf

Reference39 articles.

1. Low temperature polycrystalline silicon: a review on deposition, physical properties and solar cell applications

2. Thin-Film Silicon –Growth Process and Solar Cell Application–

3. Comparison of a-Si TFTs fabricated by Cat-CVD and PECVD methods

4. Direct Kinetic Studies of Silicon Hydride Radicals in the Gas Phase

5. Reaction mechanism of silicon Cat-CVD

Cited by 6 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Ab Initio Chemical Kinetics for the Thermal Decomposition of SiH2+ and SiH3+ Ions and Related Reverse Ion–Molecule Reactions of Interest to PECVD of α-Si:H Films;Plasma Chemistry and Plasma Processing;2019-07-24

2. Elementary reaction profile and chemical kinetics study of [C(1D)/(3P) + SiH4] with the CCSD(T) method;Chemical Physics Letters;2017-07

3. Ab Initio Chemical Kinetics for the Thermal Decomposition of SiH4 + Ion and Related Reverse Ion–Molecule Reactions of Interest to PECVD of a-Si:H Films;Plasma Chemistry and Plasma Processing;2017-06-03

4. Ab Initio Chemical Kinetics for SiHxReactions with Si2Hy(x= 1,2,3,4;y= 6,5,4,3;x+y= 7) under a-Si:H CVD Condition;International Journal of Chemical Kinetics;2017-01-19

5. Capturing H and H2by SiHx+(x≤ 4) ions: Comparison between Langevin and quantum statistical models;Japanese Journal of Applied Physics;2017-01-10

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