Ab Initio Chemical Kinetics for SiHxReactions with Si2Hy(x= 1,2,3,4;y= 6,5,4,3;x+y= 7) under a-Si:H CVD Condition
Author:
Affiliation:
1. Center for Interdisciplinary Molecular Science; Department of Applied Chemistry; National Chiao Tung University; Hsinchu 300 Taiwan
2. Department of Physical Chemistry; Hanoi University of Science and Technology; Hanoi Vietnam
Publisher
Wiley
Subject
Inorganic Chemistry,Organic Chemistry,Physical and Theoretical Chemistry,Biochemistry
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1. Comparison of a-Si TFTs fabricated by Cat-CVD and PECVD methods
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1. Electronic structure of the ground and excited states of neutral and charged silicon hydrides, SiHx0/+/−, x = 1–4;Physical Chemistry Chemical Physics;2022
2. Ab Initio Chemical Kinetics for the Thermal Decomposition of SiH2+ and SiH3+ Ions and Related Reverse Ion–Molecule Reactions of Interest to PECVD of α-Si:H Films;Plasma Chemistry and Plasma Processing;2019-07-24
3. Ideal gas thermochemical properties of silicon containing inorganic, organic compounds, radicals, and ions;International Journal of Chemical Kinetics;2018-06-12
4. Ab Initio Chemical Kinetics for the Thermal Decomposition of SiH4 + Ion and Related Reverse Ion–Molecule Reactions of Interest to PECVD of a-Si:H Films;Plasma Chemistry and Plasma Processing;2017-06-03
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