Improved self-assembly of poly(dimethylsiloxane-b -ethylene oxide) using a hydrogen-bonding additive-Reference-Cited by-同舟云学术

Improved self-assembly of poly(dimethylsiloxane-b -ethylene oxide) using a hydrogen-bonding additive

Published:2016-03-17 Issue:14 Volume:54 Page:2200-2208
ISSN:0887-624X
Container-title:Journal of Polymer Science Part A: Polymer Chemistry
language:en
Short-container-title:J. Polym. Sci. Part A: Polym. Chem.

Author:

Luo Yingdong¹²,Kim Bongkeun¹,Montarnal Damien¹³,Mester Zoltan⁴,Pester Christian W.¹,McGrath Alaina J.¹,Hill Glake⁵,Kramer Edward J.¹⁶⁷,Fredrickson Glenn H.¹⁶⁷,Hawker Craig J.¹²⁶

Affiliation:

1. Materials Research Laboratory; University of California; Santa Barbara California 93106

2. Department of Chemistry and Biochemistry; University of California; Santa Barbara, California 93106

3. Laboratoire de Chimie Catalyse Polymères et Procédés (C2P2), Université de Lyon 1, CPE Lyon, CNRS, UMR 5265; Villeurbanne France

4. Department of Chemical and Biological Engineering; Princeton University; New Jersey 08544

5. Department of Chemistry and Biochemistry; Jackson State University; Jackson Mississippi 39217

6. Materials Department; University of California; Santa Barbara California 93106

7. Department of Chemical Engineering; University of California; Santa Barbara California 93106

Funder

MRL Central Facilities

MRSEC Program of the NSF

NSF-funded Materials Research Facilities Network

Publisher

Wiley

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1002/pola.28093/fullpdf

Reference75 articles.

1. Block Copolymer Nanolithography: Translation of Molecular Level Control to Nanoscale Patterns

2. Block Copolymer Lithography

3. Ordering in thin films of block copolymers: Fundamentals to potential applications

4. Block Copolymer Based Nanostructures: Materials, Processes, and Applications to Electronics

5. Templated Self-Assembly of Block Copolymers: Top-Down Helps Bottom-Up

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