Direct measurement of the nitrogen content by XPS in self-passivated TaNxthin films-Reference-Cited by-同舟云学术

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Direct measurement of the nitrogen content by XPS in self-passivated TaNxthin films

Published:2008-11 Issue:11 Volume:40 Page:1430-1437
ISSN:0142-2421
Container-title:Surface and Interface Analysis
language:en
Short-container-title:Surf. Interface Anal.

Author:

Lamour Patrice,Fioux Philippe,Ponche Arnaud,Nardin Michel,Vallat Marie-France,Dugay Pierre,Brun Jean-Paul,Moreaud Nathanaël,Pinvidic Jean-Marc

Publisher

Wiley

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference57 articles.

1. Characteristics of ultrathin Ta and TaN films

2. Critical review of the current status of thickness measurements for ultrathin SiO2 on Si Part V: Results of a CCQM pilot study

3. Universality Classes of Inelastic Electron Scattering Cross-sections

4. Slowing down of medium-energy electrons in solids

5. Background subtraction

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