Current Boosting of Self‐Aligned Top‐Gate Amorphous InGaZnO Thin‐Film Transistors under Driving Conditions

Author:

Park Jingyu1,Choi Sungju1,Kim Changwook1,Shin Hong Jae2,Jeong Yun Sik2,Bae Jong Uk2,Oh Chang Ho2,Oh Saeroonter3ORCID,Kim Dae Hwan1

Affiliation:

1. School of Electrical Engineering Kookmin University Seoul 02707 Republic of Korea

2. Large Display Business Unit LG Display Company Paju 10845 Republic of Korea

3. Department of Electrical and Electronic Engineering Hanyang University Ansan 15588 Republic of Korea

Abstract

AbstractOxide semiconductor transistors control the brightness and color of organic light‐emitting diode (OLED) displays in large‐screen televisions to portable telecommunications devices. Oxide semiconductor thin‐film transistors under driving conditions are required to maintain a steady current through the OLED for constant illuminance. Interestingly, for driving conditions under strong saturation where both gate and drain bias are high, a boosting phenomenon of the drain current is discovered, even with compensation of the threshold voltage. In this paper, the current boosting effect of self‐aligned InGaZnO transistors under driving conditions is comprehensively investigated. Based on experimental extraction methods, two distinct regions within the device are identified: an electron‐capture‐dominant region including electron trapping in the gate insulator and OO dimer bond‐breaking, and an electron‐emission‐dominant region caused by peroxide formation. A dual‐transistor‐in‐series model is proposed, where each region is modeled as a local transistor. The current boosting phenomena as a function of time are well‐reproduced for various channel length devices, which validate the accuracy of the model. Better understanding of the underlying mechanisms enables increased effectiveness of compensation schemes for transistors under long‐term current‐driving conditions.

Funder

National Research Foundation of Korea

LG Display

Publisher

Wiley

Subject

Electronic, Optical and Magnetic Materials

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