Controlling Defect Formation of Nanoscale AlN: Toward Efficient Current Conduction of Ultrawide‐Bandgap Semiconductors
Author:
Affiliation:
1. Department of Electrical Engineering and Computer Science University of Michigan Ann Arbor MI 48109 USA
2. Department of Materials Science and Engineering University of Michigan Ann Arbor MI 48109 USA
Funder
National Science Foundation
Publisher
Wiley
Subject
Electronic, Optical and Magnetic Materials
Link
https://onlinelibrary.wiley.com/doi/pdf/10.1002/aelm.202000337
Reference45 articles.
1. An aluminium nitride light-emitting diode with a wavelength of 210 nanometres
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5. Perspective: Ga2O3for ultra-high power rectifiers and MOSFETS
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