43‐4: Ultra‐High On‐Current Vertical Field‐Effect Transistor with Submicron Channel Length of 0.5 µm Using CAAC‐IGZO
Author:
Affiliation:
1. Semiconductor Energy Laboratory Co., Ltd. Tochigi Japan
2. Semiconductor Energy Laboratory Co., Ltd. Kanagawa Japan
Abstract
Publisher
Wiley
Subject
General Medicine
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1. Insights on Asymmetrical Electrode Geometric Effect to Enhance Gate-Drain-Bias Stability of Vertical-Channel InGaZnO Thin-Film Transistor;Electronic Materials Letters;2024-07-30
2. 1-Mbit 3-D DRAM Using a Monolithically Stacked Structure of a Si CMOS and Heterogeneous IGZO FETs;IEEE Journal of the Electron Devices Society;2024
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