Rational Control of Diffraction and Interference from Conformal Phase Gratings: Toward High-Resolution 3D Nanopatterning-Reference-Cited by-同舟云学术

Rational Control of Diffraction and Interference from Conformal Phase Gratings: Toward High-Resolution 3D Nanopatterning

Published:2014-09-25 Issue:12 Volume:2 Page:1213-1220
ISSN:2195-1071
Container-title:Advanced Optical Materials
language:en
Short-container-title:Advanced Optical Materials

Author:

Hyun Jerome K.¹,Park Junyong¹,Kim Eunhye¹,Lauhon Lincoln J.²,Jeon Seokwoo¹

Affiliation:

1. Department of Materials Science and Engineering; KAIST Institute for the Nanocentury; Korea Advanced Institute of Science and Technology (KAIST); Daejeon 305-701 Republic of Korea

2. Department of Materials Science and Engineering; Northwestern University; Evanston IL 60202 USA

Funder

Ministry of Science, ICT & Future Planning

Publisher

Wiley

Subject

Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1002/adom.201400348/fullpdf

Reference38 articles.

1. Phase contrast, a new method for the microscopic observation of transparent objects

2. Phase contrast, a new method for the microscopic observation of transparent objects part II

3. Using an elastomeric phase mask for sub-100 nm photolithography in the optical near field

4. Generating ∼90 nanometer features using near-field contact-mode photolithography with an elastomeric phase mask

5. Nanopatterning with conformable phase masks

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