Flat Optical and Plasmonic Devices Using Area‐Selective Ion‐Beam Doping of Silicon-Reference-Cited by-同舟云学术

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Flat Optical and Plasmonic Devices Using Area‐Selective Ion‐Beam Doping of Silicon

Published:2018-01-15 Issue:5 Volume:6 Page:1701027
ISSN:2195-1071
Container-title:Advanced Optical Materials
language:en
Short-container-title:Advanced Optical Materials

Author:

Salman Jad¹,Hafermann Martin²,Rensberg Jura²,Wan Chenghao¹³,Wambold Raymond¹,Gundlach Bradley S.¹,Ronning Carsten²,Kats Mikhail A.¹³

Affiliation:

1. Department of Electrical and Computer Engineering University of Wisconsin—Madison 1415 Engineering Drive Madison WI 53706 USA

2. Institute of Solid State Physics Friedrich Schiller University Jena 07743 Jena Germany

3. Department of Materials Science and Engineering University of Wisconsin—Madison 1509 University Avenue Madison WI 53706 USA

Funder

Office of Naval Research

Publisher

Wiley

Subject

Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/adom.201701027

Reference58 articles.

1. Principles of Nano-Optics

2. Nanoantennas for visible and infrared radiation

3. Plasmonic Nanoantennas: Fundamentals and Their Use in Controlling the Radiative Properties of Nanoemitters

4. Scanning plasmon near-field microscope

5. Phonon-enhanced light–matter interaction at the nanometre scale

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