g‐C3N4 Monolayer/2D Mica Nanohybrids with Highly Effective UV–HEV‐Screening Function

Author:

Piao Huiyan12,Choi Goeun234,Rejinold N. Sanoj2,Vinu Ajayan5ORCID,Choy Jin‐Ho267

Affiliation:

1. Department of Chemistry National Demonstration Centre for Experimental Chemistry Education Yanbian University Yanji Jilin 133002 China

2. Intelligent Nanohybrid Materials Laboratory (INML) Institute of Tissue Regeneration Engineering (ITREN) Dankook University Cheonan 31116 Republic of Korea

3. College of Science and Technology Dankook University Cheonanm 31116 Republic of Korea

4. Department of Nanobiomedical Science and BK21 PLUS NBM Global Research Center for Regenerative Medicine Dankook University Cheonan 31116 Republic of Korea

5. Global Innovative Centre for Advanced Nanomaterials (GICAN) College of Engineering Science and Environment (CESE) School of Engineering The University of Newcastle Callaghan 2308 Australia

6. Department of Pre‐medical Course College of Medicine Dankook University Cheonan 31116 Republic of Korea

7. International Research Frontier Initiative (IRFI) Institute of Innovative Research Tokyo Institute of Technology Yokohama 226–8503 Japan

Abstract

AbstractExcessive exposure to ultraviolet (UV) and high‐energy visible (HEV) light can cause sunburns, wrinkles, and even skin cancer. Therefore, the development of effective UV–HEV‐shielding agents is of great importance to human health. In this study, semiconducting graphitic carbon nitride (g‐C3N4) is incorporated into the interlayer space of mica through the intercalation of cyanamide and subsequent pyrolysis reactions to form a semiconductor–insulator nanohybrid, namely g‐C3N4–mica, with a 1:1 heterostructure. The g‐C3N4–mica nanohybrid exhibits excellent UV–HEV absorption properties below 450 nm, and its photocatalytic activity is quenched owing to the effective screening of photocatalytic active sites by the insulating mica. It is strongly believed that the proposed g‐C3N4–mica nanohybrid can be applied as a UV–HEV blocking agent owing to its excellent UV–HEV (200–450 nm)‐screening property without any photocatalytic effect or phototoxicity.

Funder

Ministry of Education

Publisher

Wiley

Subject

Mechanical Engineering,Mechanics of Materials

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