Area‐Selective Growth of HfS 2 Thin Films via Atomic Layer Deposition at Low Temperature

Author:

Cao Yuanyuan1,Wähler Tobias2,Park Hyoungwon3,Will Johannes4,Prihoda Annemarie5,Moses Badlyan Narine6,Fromm Lukas7,Yokosawa Tadahiro4,Wang Bingzhe8,Guldi Dirk M.8ORCID,Görling Andreas7,Maultzsch Janina6ORCID,Unruh Tobias5ORCID,Spiecker Erdmann4ORCID,Halik Marcus3ORCID,Libuda Jörg2,Bachmann Julien19ORCID

Affiliation:

1. Chemistry of Thin Film Materials (CTFM) Interdisciplinary Center of Nanostructured Films (IZNF) Friedrich Alexander University of Erlangen‐Nuremberg Cauerstr. 3 Erlangen 91058 Germany

2. Interface Research and Catalysis Erlangen Center for Interface Research and Catalysis (ECRC) Friedrich Alexander University of Erlangen‐Nuremberg Egerlandstr. 3 Erlangen 91058 Germany

3. Chair of Organic Materials and Devices (OMD) Friedrich Alexander University of Erlangen‐Nuremberg IZNF Cauerstr. 3 Erlangen 91058 Germany

4. Institute of Micro‐ and Nanostructure Research and Center for Nanoanalysis and Electron Microscopy (CENEM) Friedrich Alexander University of Erlangen‐Nuremberg IZNF Cauerstr. 3 Erlangen 91058 Germany

5. Institute for Crystallography and Structural Physics (ICSP) Friedrich Alexander University of Erlangen‐Nuremberg IZNF Staudtstr. 3 Erlangen 91058 Germany

6. Chair of Experimental Physics, Department of Physics Friedrich Alexander University of Erlangen‐Nuremberg Staudtstr. 7 Erlangen 91058 Germany

7. Chair of Theoretical Chemistry Department of Chemistry and Pharmacy Friedrich Alexander University of Erlangen‐Nuremberg Egerlandstr. 3 Erlangen 91058 Germany

8. Chair of Physical Chemistry I, Department of Chemistry and Pharmacy Friedrich Alexander University of Erlangen‐Nuremberg Egerlandstr. 3 Erlangen 91058 Germany

9. Institute of Chemistry Saint‐Petersburg State University Universitetskii pr. 26 St. Petersburg 198504 Russia

Publisher

Wiley

Subject

Mechanical Engineering,Mechanics of Materials

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