1. Advanced DUV photolithography in a pilot line environment;Ausschnitt;IBM J. Res. Dev.,1997
2. Brunner , T. 1997 Pushing the limits of lithography for IC production 9
3. Enhanced resolution for future fabrication;Fritze;IEEE Circuits Devices Mag.,2003
4. Optical proximity correction with linear regression;Gu;IEEE Trans. Semicond. Manuf.,2008
5. Manufacturing with DUV lithography;Holmes;IBM J. Res. Dev.,1997