Enhanced resolution for future fabrication-Reference-Cited by-同舟云学术

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Enhanced resolution for future fabrication

Published:2003-01 Issue:1 Volume:19 Page:43-47
ISSN:8755-3996
Container-title:IEEE Circuits and Devices Magazine
language:en
Short-container-title:IEEE Circuits Devices Mag.

Author:

Fritze M.,Chen C.K.,Astolfi D.K.,Yost D.R.,Burns J.A.,Chang-Lee Chen ,Gouker P.M.,Suntharalingam V.,Wyatt P.W.,Keast C.L.

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Electrical and Electronic Engineering,Instrumentation,Electronic, Optical and Magnetic Materials

Link

http://xplorestaging.ieee.org/ielx5/101/26386/01175107.pdf?arnumber=1175107

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Variation-Tolerant Adaptive Voltage Systems;Managing Temperature Effects in Nanoscale Adaptive Systems;2011-07-28

2. Advanced Lithography;Introduction to Microfabrication;2010-11-09

3. Engineering surface and development of a new DNA micro array chip;Wear;2006-02

4. Nanopatterning with UV Optical Lithography;MRS Bulletin;2005-12

5. Projection optical lithography;Materials Today;2005-02

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