Advanced DUV photolithography in a pilot line environment-Reference-Cited by-同舟云学术

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Advanced DUV photolithography in a pilot line environment

Published:1997-01 Issue:1.2 Volume:41 Page:21-37
ISSN:0018-8646
Container-title:IBM Journal of Research and Development
language:
Short-container-title:IBM J. Res. & Dev.

Author:

Ausschnitt C. P.,Thomas A. C.,Wiltshire T. J.

Publisher

IBM

Subject

General Computer Science

Link

http://xplorestaging.ieee.org/ielx5/5288520/5389361/05389363.pdf?arnumber=5389363

Cited by 14 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Complementary Detectors for DUV Sensing by CMOS Logic Technology;2024 International VLSI Symposium on Technology, Systems and Applications (VLSI TSA);2024-04-22

2. Introducing Water Electrolithography;ACS Omega;2021-09-21

3. Noise and spectral stability of deep-UV gas-filled fiber-based supercontinuum sources driven by ultrafast mid-IR pulses;Scientific Reports;2020-03-18

4. Nanotechnology for Reducing Orthopedic Implant Infections: Synthesis, Characterization, and Properties;Orthopedic Biomaterials;2017

5. Controlled Deposition of Tin Oxide and Silver Nanoparticles Using Microcontact Printing;Crystals;2015-02-13

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