1. Microelectronic Materials, Adam Hilger, Bristol, 1989.
2. The preparation, properties and applications of silicon nitride thin films deposited by plasma-enhanced chemical vapor deposition
3. and in and (eds), Chemical Vapour Deposition — Principles and Applications, Academic, London, 1993, Chap. 1.
4. and in and (eds), Chemical Vapour Deposition—Principle and Applications, Academic, London, 1993, Chap. 7.
5. Mechanism of SiNxHy deposition from N2–SiH4 plasma